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The Dynamics of Thin Film Growth: A Modeling Study |
Abstract |
For closed-loop control of thin film depos … For closed-loop control of thin film deposition, one would like to
directly control film properties such as roughness, stress, or
composition, rather than process parameters like
temperatures and flow rates. This requires a
model of the dynamic response of film properties to
changes in process conditions.
Direct atomistic simulation is far too slow to be used in this
capacity, but a promising approach we explore here is to derive
reduced-order dynamic models from atomistic simulations.
<p>
In this paper, we consider film growth on a vicinal surface
using a kinetic Monte
Carlo model. The temperature range spans the transition from
smooth step flow to rough island growth.
Proper Orthogonal Decomposition is used to extract
the dominant spatial modes from the KMC simulations. Only five spatial modes
adequately represent the roughness dynamics for all simulated times and
temperatures, indicating that a 5-state model may be
sufficient for real-time roughness control. ufficient for real-time roughness control. +
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Authors | Martha A. Gallivan, Richard M. Murray, David G. Goodwin + |
ID | 2000e + |
Source | Electrochemical Society, May 2000 + |
Tag | gmg-ecs + |
Title | The Dynamics of Thin Film Growth: A Modeling Study + |
Type | Conference Paper + |
Categories | Papers |
Modification date This property is a special property in this wiki.
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15 May 2016 06:19:27 + |
URL This property is a special property in this wiki.
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http://www.cds.caltech.edu/~murray/preprints/gmg00-ecs.pdf + |
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The Dynamics of Thin Film Growth: A Modeling Study + | Title |
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